Role of PEG Additive in Copper Damascene Process
نویسندگان
چکیده
منابع مشابه
Copper voids improvement for the copper dual damascene interconnection process
The mechanism of copper (Cu) voids formation from electro-chemical plating (ECP) followed by Cu chemical mechanical polishing (CMP) are studied in Cu dual-damascene interconnection. The formation of Cu voids at metal lines is the main problem that causes not only the failure of via-induced metal-island corrosion but also yield loss. The galvanic theory and Cu lifting mechanism are proposed to e...
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ژورنال
عنوان ژورنال: Materia Japan
سال: 2003
ISSN: 1340-2625,1884-5843
DOI: 10.2320/materia.42.910